Bob Naber

Optimizing the interface : Between design and manufacturing

Jason Sweis, Thomas Laidig, Judy Huckaby, 2006 .

Simultaneous layout, process, and model optimization within an integrated design-for-yield environment

Jason Sweis, Lynn Cai, Bob Naber, 2006, Photomask Japan.

Unifying the RET design flow with portable modeling information

Jason Sweis, Tom Laidig, Bob Naber, 2006, Photomask Japan.

Improved cycle time of mask repair by optimizing nanomachining with photolithographic imaging simulation

David A. Lee, Ron Bozak, Peter Brooker, 2005, Photomask Japan.