Mireille Maenhoudt

发表

Feasibility of printing 0.1-μm technology with optical lithography

Kurt G. Ronse, Winfried Kaiser, Mireille Maenhoudt, 1999, Advanced Lithography.

Lithography aspects of dual-damascene interconnect technology

Kurt G. Ronse, Mireille Maenhoudt, Diziana Van Goidsenhoven, 2001, Microelectronic and MEMS Technologies.

NA/σ optimization strategies for an advanced DUV stepper applied to 0.25-μm and sub-0.25-μm critical levels

Geert Vandenberghe, Patrick Jaenen, Kurt G. Ronse, 1997, Advanced Lithography.

CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-μm gate printing

Kurt G. Ronse, Jo Finders, Jan B. van Schoot, 1998, Advanced Lithography.

Lithography Options for the 32 nm Half Pitch Node and Beyond

Vincent Wiaux, Geert Vandenberghe, Eric Hendrickx, 2009, IEEE Transactions on Circuits and Systems I: Regular Papers.

Optimizing overlay sampling for higher yields

Mireille Maenhoudt, Xuemei Chen, Moshe E. Preil, 2003 .

Resist reflow for 193-nm low-K1 lithography contacts

Kevin D. Lucas, Mireille Maenhoudt, Grozdan Grozev, 2003, SPIE Advanced Lithography.

Alternative process schemes for double patterning that eliminate the intermediate etch step

Mireille Maenhoudt, Roel Gronheid, N. Stepanenko, 2008, SPIE Advanced Lithography.

A methodology for the characterization of topography induced immersion bubble defects

Peter De Bisschop, Mireille Maenhoudt, Tony DiBiase, 2004, SPIE Advanced Lithography.

Recent trends and progress in deep-UV lithography

Geert Vandenberghe, Anne-Marie Goethals, Kurt G. Ronse, 1999, Other Conferences.

Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

Mireille Maenhoudt, Andy Miller, Patrick Wong, 2009, Lithography Asia.

Status of ArF lithography for the 130-nm technology node

Geert Vandenberghe, Frieda Van Roey, Anne-Marie Goethals, 2000, Advanced Lithography.

Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations

Jo Finders, Shaunee Cheng, Mireille Maenhoudt, 2009 .

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Jo Finders, Timon Fliervoet, Mireille Maenhoudt, 2009, Advanced Lithography.

30nm half-pitch metal patterning using Moti CD shrink technique and double patterning

Vincent Wiaux, Mireille Maenhoudt, Johan Vertommen, 2008, SPIE Advanced Lithography.

Split and design guidelines for double patterning

Vincent Wiaux, Geert Vandenberghe, Patrick Jaenen, 2008, SPIE Advanced Lithography.

Impact of water and top-coats on lithographic performance in 193-nm immersion lithography

Takahiro Matsuo, Masaru Sasago, Mireille Maenhoudt, 2005, SPIE Advanced Lithography.

A methodology for double patterning compliant split and design

Vincent Wiaux, Geert Vandenberghe, Mireille Maenhoudt, 2008, Lithography Asia.

Printability verification for double-patterning technology

Vincent Wiaux, Mireille Maenhoudt, Staf Verhaegen, 2008, Photomask Technology.

Checking design conformance and optimizing manufacturability using automated double patterning decomposition

Vincent Wiaux, Mireille Maenhoudt, Staf Verhaegen, 2008, SPIE Advanced Lithography.

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Patrick Jaenen, Jo Finders, Mireille Maenhoudt, 2007, SPIE Advanced Lithography.

Lithography options for the 32nm half pitch node and beyond

Eric Hendrickx, Mireille Maenhoudt, Roel Gronheid, 2008, CICC.

Automated method for overlay sample plan optimization based on spatial variation modeling

Mireille Maenhoudt, Moshe E. Preil, Xuemei Chen, 2001, SPIE Advanced Lithography.

Ultimate contact hole resolution using immersion lithography with line/space imaging

Mireille Maenhoudt, Joost Bekaert, Timothy Wu, 2009, Advanced Lithography.

Novel aberration monitor for optical lithography

Peter De Bisschop, Mireille Maenhoudt, Casper A. H. Juffermans, 1999, Advanced Lithography.

Immersion lithography and double patterning in advanced microelectronics

Vincent Wiaux, Geert Vandenberghe, Mireille Maenhoudt, 2010, International Conference on Micro- and Nano-Electronics.

Immersion specific defect mechanisms: findings and recommendations for their control

Frieda Van Roey, Mireille Maenhoudt, Monique Ercken, 2006, SPIE Advanced Lithography.

Lithographic process simulation for scanners

Michael Arnz, Jan Baselmans, Mireille Maenhoudt, 1998, Advanced Lithography.

In-line metrology and inspection for process control during 3D stacking of IC's

Eric Beyne, Sandip Halder, Mireille Maenhoudt, 2012, 2011 IEEE International 3D Systems Integration Conference (3DIC), 2011 IEEE International.

Limits of optical lithography

Kurt G. Ronse, Mireille Maenhoudt, Staf Verhaegen, 2000, Advanced Lithography.

The use of unpatterned wafer inspection for immersion lithography defectivity studies

Mireille Maenhoudt, Dieter Van Den Heuvel, Gavin Simpson, 2006, SPIE Advanced Lithography.

Double patterning for 32nm and below: an update

Jo Finders, Shaunee Cheng, Mireille Maenhoudt, 2008, SPIE Advanced Lithography.

248nm and 193nm lithography for damascene patterning

Vincent Wiaux, Kurt G. Ronse, Mireille Maenhoudt, 2001 .

Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274µm2 6T-SRAM cell and advanced CMOS logic circuits

Vincent Wiaux, Geert Vandenberghe, Patrick Jaenen, 2005 .

Exploration of etch step interactions in the dual patterning process for process modeling

Vincent Wiaux, Lawrence S. Melvin, Mireille Maenhoudt, 2008 .