Chip Steinhaus

Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications

Regina Soufli, Stanley Mrowka, Michael E. Malinowski, 2002, SPIE Advanced Lithography.

Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

Michael E. Malinowski, W. Miles Clift, Leonard E. Klebanoff, 2001, SPIE Advanced Lithography.

Studies of EUV contamination mitigation

Michael E. Malinowski, Leonard E. Klebanoff, Chip Steinhaus, 2002, SPIE Advanced Lithography.

First environmental data from the EUV engineering test stand

Michael E. Malinowski, W. Miles Clift, Leonard E. Klebanoff, 2001, SPIE Advanced Lithography.