C. Boukouras

Si etching in high-density SF 6 plasmas for microfabrication: surface roughness formation

E. Gogolides, V. Constantoudis, G. Kokkoris, 2004 .

Characteristics of W and Cu/W gate MOS diodes fabricated by a process utilizing LPCVD of W and CU lift-off

D. Davazoglou, V. Ioannou-Sougleridis, D. Kouvatsos, 2003 .