Woosung Han

Improved scatterometry method of critical dimension measurements and its application for control of development process

Donggun Lee, Hakseung Han, Irina Pundaleva, 2006, SPIE Advanced Lithography.

Fast mask CD uniformity measurement using zero order diffraction from memory array pattern

Jinseok Heo, Seongwoon Choi, Jinhong Park, 2009, Advanced Lithography.

Optical proximity correction for elongated contact-hole printing

Seong-Woon Choi, Young-Chang Kim, Sooryong Lee, 2008, SPIE Advanced Lithography.

Assessment of full-chip level EUV optical correction for sub-40nm memory device

Insung Kim, Seongwoon Choi, Joo-on Park, 2009, Advanced Lithography.

Impact of total measurement uncertainty on overlay error correction

Jangho Shin, Jeong-Ho Yeo, Young-Seog Kang, 2010 .

Study of higher electron beam energy for the mask production for 30 nm node technology

Sanghee Lee, Seongwoon Choi, Woosung Han, 2006, Photomask Japan.

Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes

Irina Pundaleva, Woosung Han, Roman Chalykh, 2007, SPIE Advanced Lithography.

Process and chamber health monitoring of plasma enhanced ti deposition process through high performance VI-probe

Seong Woon Choi, Yongjin Kim, Woosung Han, 2007, 2007 International Symposium on Semiconductor Manufacturing.

A study of shift control using the clutch pressure pattern in automatic transmission

Woosung Han, Seung-Jong Yi, Woo-Young Han, 2003 .