I. Englard

A holistic metrology sensitivity study for pattern roughness quantification on EUV patterned device structures with mask design induced roughness

Brid Connolly, Gaoliang Dai, Ilan Englard, 2018, Metrology, Inspection, and Process Control for Microlithography XXXII.

Study of EUV mask e-beam inspection conditions for HVM

Greg Hughes, Shmoolik Mangan, C. C. Lin, 2011, Photomask Technology.

Study of EUV mask e-beam inspection conditions for HVM

Shmoolik Mangan, Ran Brikman, Alex Goldenshtein, 2011, Photomask Technology.

Characterizing electron beam induced damage in metrology and inspection of advance devices

Ilan Englard, Hamed Sadeghian, Abbas Mohtashami, 2017, European Mask and Lithography Conference.

Novel approach for immersion lithography defectivity control to increase productivity

Peter Vanoppen, Ilan Englard, Erez Ravid, 2008, SPIE Advanced Lithography.