F. Lebland

Photo-assisted deposition of thin films on III–V semiconductors with UV and IR lamps

C. Licoppe, J. Moison, M. Bensoussan, 1990 .

Multiple photo-assisted CVD of thin-film materials for III-V device technology

Yves I. Nissim, Jean M. Moison, Francoise Houzay, 1991, Other Conferences.

Stress cancellation in silicon oxynitride/InP structures obtained by rapid thermal chemical vapor deposition

C. Licoppe, Y. Nissim, F. Lebland, 1992 .