Yuho Kanaya

Technology development progress of digital scanner

Yusuke Saito, S. Owa, D. Tseng, 2022, Advanced Lithography.

Improving the measurement algorithm for alignment

Shinichi Nakajima, Koji Yoshida, Yuho Kanaya, 2001, SPIE Advanced Lithography.

Outlier rejection with mixture models in alignment

Shinichi Nakajima, Taro Sugihara, Mengling Li, 2003, SPIE Advanced Lithography.

Expected performance of digital scanner and the potential application for advanced semiconductor fabrication

Yusuke Saito, S. Owa, D. Tseng, 2023, Advanced Lithography.

Data preparation for digital scanner

Yusuke Saito, Y. Okudaira, K. Komuro, 2022, Photomask Technology.

Subpixel pattern edge placement controllability of digital scanner

Soichi Owa, Yuho Kanaya, Noriyuki Hirayanagi, 2021, Photomask Technology.

Digital scanner, optical maskless exposure tool with DUV solid state laser

Soichi Owa, Yuho Kanaya, Noriyuki Hirayanagi, 2021, Advanced Lithography.