Â. Crespi

发表

Atomic layer etching of gallium nitride using fluorine-based chemistry

M. Boufnichel, P. Lefaucheux, R. Dussart, 2023, Journal of Vacuum Science & Technology A.

Hydrogen plasma etching mechanism at the a-C:H/a-SiCx:H interface: A key factor for a-C:H adhesion

C. Figueroa, C. D. Boeira, L. M. Leidens, 2018, Applied Surface Science.

Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on copper

I. Vickridge, J. Alvarez, M. Hugon, 2020, Thin Solid Films.

Adhesion of hydrogenated amorphous carbon films on ferrous alloy by intermediate nitrogen plasma treatment in silicon-containing interlayers

C. Figueroa, C. D. Boeira, M.E.H. Maia da Costa, 2019, Vacuum.

The Use of Sacrificial Graphite-like Coating to Improve Fusion Efficiency of Copper in Selective Laser Melting

P. Peyre, P. Chapon, M. Hugon, 2023, Materials.

The Role of Amorphous Nanocrystalline Carbon Films in Interference on Flexible Copper Foils

M. Hugon, T. Minea, Â. Crespi, 2022, ACS Applied Electronic Materials.

Influence of Surface Microstructure and Chemical Composition on the Corrosion Resistance of Plain Steel Modified by Plasma-Assisted Diffusion

I. Baumvol, C. Marino, C. Figueroa, 2014 .

Plasma post-oxidation mechanisms of nitrided ferrous alloys

I. Baumvol, A. C. Rovani, F. Cemin, 2011 .

Carbon nitride film deposition by active screen plasma nitriding

G. Soares, I. Baumvol, M. Dotto, 2011 .

Substrate Bias Voltage Tailoring the Interfacial Chemistry of a-SiC x:H: A Surprising Improvement in Adhesion of a-C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen.

C. Figueroa, V. Antunes, F. Alvarez, 2019, ACS applied materials & interfaces.