Haruyuki Nomura

Study on modeling of resist heating effect correction in EB mask writer EBM-9000

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, 2015, Other Conferences.

Correction of resist heating effect on variable shaped beam mask writer

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, 2016 .

Electron beam mask writer EBM-9500 for logic 7nm node generation

Kenichi Saito, Haruyuki Nomura, Takashi Kamikubo, 2016, Photomask Technology.

Electron beam lithographic modeling assisted by artificial intelligence technology

Haruyuki Nomura, Takashi Kamikubo, Noriaki Nakayamada, 2017, Photomask Japan.

Study on physical model of resist surface charge in electron beam mask writer EBM-9500PLUS

Haruyuki Nomura, Noriaki Nakayamada, Rumi Ito, 2020, Photomask Technology.

Study on modeling of resist surface charge effect on mask blanks with charge dissipation layer in electron beam mask writers

Haruyuki Nomura, Takashi Kamikubo, Noriaki Nakayamada, 2021, Photomask Technology.

Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers

Haruyuki Nomura, Noriaki Nakayamada, Kenji Ohtoshi, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.