Jun Yashima

Study on modeling of resist heating effect correction in EB mask writer EBM-9000

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, 2015, Other Conferences.

A deep learning mask analysis toolset using mask SEM digital twins

Jun Yashima, Noriaki Nakayamada, Mikael Wahlsten, 2020, Photomask Technology.

Reference-Set Computation in Children: Mandarin-Speaking Children’s Pronoun Interpretation in Avoid Pronoun Contexts

Jun Yashima, Natsumi Shibata, Jun Yashima, 2014 .

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Kenichi Saito, Hiroyoshi Ando, Takashi Kamikubo, 2014, Photomask Technology.

Study of heating effect on CAR in electron beam mask writing

Takashi Kamikubo, Jun Yashima, Hirohito Anze, 2007, Photomask Japan.

Electron-beam mask writer EBM-6000 for 45 nm HP node

Yusuke Sakai, Jun Yashima, Noriaki Nakayamada, 2007, Photomask Japan.

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hiroyoshi Ando, Takashi Kamikubo, Jun Yashima, 2014, Photomask and Next Generation Lithography Mask Technology.

Electron beam mask writer EBM-9500 for logic 7nm node generation

Kenichi Saito, Haruyuki Nomura, Takashi Kamikubo, 2016, Photomask Technology.

Enhancement of global CD correction and data processing in EB mask writer EBM-8000

Yasuo Kato, Jun Yashima, Noriaki Nakayamada, 2011, Photomask Technology.

Correction technique of EBM-6000 prepared for EUV mask writing

Jun Yashima, Munehiro Ogasawara, Shuichi Tamamushi, 2007, SPIE Photomask Technology.