Madhukar Bhaskara Rao

发表

Challenges in Post CMP Cleaning for Advanced Technology Nodes

Gautam Banerjee, Dnyanesh Chandrakant Tamboli, Madhukar Bhaskara Rao, 2009 .

Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography

Peng Zhang, Pat Cook, Todd Davis, 2005, SPIE Advanced Lithography.

Combined pattern collapse and LWR control at the 70 nm node through application of novel surface conditioner solutions

Peng Zhang, Patrick Wong, Manuel Jaramillo, 2005, SPIE Advanced Lithography.

Increasing effective resolution through surface conditioners for 1x imprint templates, and photo mask applications beyond 65nm

Peng Zhang, Madhukar Bhaskara Rao, Kosta S. Selinidis, 2006, SPIE Advanced Lithography.

Linewidth roughness reduction at the 55 nm node through combination of classical process optimization and application of surface conditioner solutions

Peng Zhang, Patrick Wong, Shawn Cassel, 2006, SPIE Advanced Lithography.

Distance-based standard deviation analysis method for line width roughness data

Peng Zhang, Thomas J. Bzik, Madhukar Bhaskara Rao, 2005, SPIE Advanced Lithography.

Sorption enhanced reaction process (SERP) for the production of hydrogen

Jeffrey Raymond Hufton, Madhukar Bhaskara Rao, Shivaji Sircar, 1998 .

Sorption Enhanced Reaction Process for Production of Hydrogen

Jeffrey Raymond Hufton, Madhukar Bhaskara Rao, Scott Jeffrey Weigel, 1997 .

Multicomponent gas separation by selective surface flow (SSF) and poly-trimethylsilylpropyne (PTMSP) membranes

Madhukar Bhaskara Rao, Madhu Anand, Shivaji Sircar, 1997 .

ACTIVATED CARBON FOR GAS SEPARATION AND STORAGE

Timothy Christopher Golden, Madhukar Bhaskara Rao, Shivaji Sircar, 1996 .

Selective Surface Flow Membrane for Gas Separation

Madhukar Bhaskara Rao, Shivaji Sircar, M. Rao, 1999 .