D. Sato

Diffuse reflectance spectroscopy measurement of substrate temperature and temperature transient during molecular beam epitaxy and implications for low-temperature III–V epitaxy

H. P. Lee, J. J. Zhou, P. Thompson, 1997 .

Simultaneous in situ measurement of substrate temperature and layer thickness using diffuse reflectance spectroscopy (DRS) during molecular beam epitaxy

H. P. Lee, J. J. Zhou, Y. Li, 1997 .

Uniform and delta doping of carbon in GaAs by solid‐source molecular beam epitaxy using electron beam evaporation: Evidence for atomic pairing

H. P. Lee, F. J. Szalkowski, D. Sato, 1995 .

Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films

S. Ohno, M. Yoshikawa, Y. Shigesato, 2003 .