Kaushik A. Kumar

Overcoming etch challenges related to EUV based patterning (Conference Presentation)

Peter Biolsi, Andrew Metz, Shinya Morikita, 2017, Advanced Lithography.

Dual frequency mid-gap capacitively coupled plasma (m-CCP) for conventional and DSA patterning at 10nm node and beyond

Akiteru Ko, Ji Xu, Nihar Mohanty, 2014, Advanced Lithography.