Francois Goasmat

发表

Effects of wafer noise on the detection of 20-nm defects using optical volumetric inspection

Hui Zhou, András E. Vladár, Bryan M. Barnes, 2015 .

Phase sensitive parametric optical metrology: exploring the limits of three-dimensional optical metrology

Jing Qin, Bryan M. Barnes, Ronald G. Dixson, 2012, Advanced Lithography.

Fourier domain optical tool normalization for quantitative parametric image reconstruction.

Hui Zhou, Jing Qin, Francois Goasmat, 2013, Applied optics.

SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT METROLOGY | NIST

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013 .

Harnessing 3D Scattered Optical Fields for sub-20 nm Defect Detection

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013 .

Multiple-order imaging for optical critical dimension metrology using microscope characterization

Hui Zhou, Jing Qin, Bryan M. Barnes, 2012, Other Conferences.

Optical volumetric inspection of sub-20nm patterned defects with wafer noise

Hui Zhou, András E. Vladár, Bryan M. Barnes, 2014, Advanced Lithography.

Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013, Advanced Lithography.

Scatterfield microscopy of 22-nm node patterned defects using visible and DUV light

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2012, Advanced Lithography.

Three-dimensional deep sub-wavelength defect detection using λ = 193 nm optical microscopy.

Hui Zhou, Francois Goasmat, Bryan M Barnes, 2013, Optics express.