J. Yi

Effect of organic acids in dilute HF solutions on removal of metal contaminants on silicon wafer

Jin-Goo Park, Eun-Suck Choi, Hyun-Tae Kim, 2018, Microelectronic Engineering.

Removal of Organic Wax and Particles on Final Polished Wafer by Ozonated DI Water

Seung-Ho Lee, Jin-Goo Park, Eun-Suck Choi, 2008 .