N. Nakayamada

Neutron spectrometry using a 3He gas ionization chamber

M. Nakazawa, T. Iguchi, H. Takahashi, 1994 .

Multi-beam mask writer, MBM-2000

Keisuke Yamaguchi, N. Nakayamada, Hiroshi Matsumoto, 2018, Photomask Japan.

Study on modeling of resist surface charge effect on mask blanks with charge dissipation layer in electron beam mask writers

Haruyuki Nomura, Takashi Kamikubo, Noriaki Nakayamada, 2021, Photomask Technology.

Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers

Haruyuki Nomura, Noriaki Nakayamada, Kenji Ohtoshi, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000

Noriaki Nakayamada, Yukihiro Masuda, Aki Fujimura, 2017, Photomask Japan.

Electron beam mask writer EBM-9500 for logic 7nm node generation

Kenichi Saito, Haruyuki Nomura, Takashi Kamikubo, 2016, Photomask Technology.

A deep learning toolset to mask analysis with SEM digital twins

Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura, 2021, Photomask Japan.

A deep learning mask analysis toolset using mask SEM digital twins

Jun Yashima, Noriaki Nakayamada, Mikael Wahlsten, 2020, Photomask Technology.