Sang-Gyun Woo

发表

Application of bi-layer resist on 70 nm node memory devices

Han-Ku Cho, Joo-Tae Moon, Yool Kang, 2005, SPIE Advanced Lithography.

Design and performance of photoresist materials for ArF lithography

James W. Thackeray, George G. Barclay, Robert J. Kavanagh, 2001, SPIE Advanced Lithography.

Degradation of pattern quality due to strong electron scattering in EUV mask

Jin Choi, Sang-Gyun Woo, Hee Bom Kim, 2010, Photomask Technology.

Analsysis of Process Parameters to Improve In-Chip Linewidth Variation

Gi-Sung Yeo, Han-Ku Cho, Jong-Rak Park, 2004 .

Full-chip-based subresolution assist features correction for mask manufacturing

Han-Ku Cho, Sang-Gyun Woo, Sung-Hoon Jang, 2007, SPIE Photomask Technology.

Measurement of the flare and in-field linewidth variation due to the flare

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2002, SPIE Advanced Lithography.

Most feasible curing process for ArF resists in device integration aspect

Han-Ku Cho, Woo-Sung Han, Yool Kang, 2003, SPIE Advanced Lithography.

Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination

Sang-Gyun Woo, Hoyoung Kang, Jongwook Kye, 1996, Photomask and Next Generation Lithography Mask Technology.

Evaluation of ArF CLM in the sub-100-nm DRAM cell

Han-Ku Cho, Dong-Hoon Chung, Woo-Sung Han, 2003, SPIE Advanced Lithography.

Comprehensive analysis of sources of total CD variation in ArF resist perspective

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Image simulation in immersion lithography using Debye integral and scattering matrix method

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

Image placement error of photomask due to pattern loading effect: analysis and correction technique for sub-45 nm node

Jin Choi, Sang-Gyun Woo, Sanghee Lee, 2008, Photomask Japan.

Era of double exposure in 70 nm node DRAM cell

Gi-Sung Yeo, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone

Joo-Tae Moon, George G. Barclay, Robert J. Kavanagh, 2001, SPIE Advanced Lithography.

Requirement of in-field illumination control for low k1 imaging below 0.3

Chan Hwang, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Han-Ku Cho, Joo-Tae Moon, Chan Hwang, 2004, SPIE Advanced Lithography.

IntenCD: an application for CD uniformity mapping of photomask and process control at maskshops

Sang-Gyun Woo, Lior Shoval, Christophe Couderc, 2008, Photomask Japan.

New simple method of extending the limit of rim phase-shift mask

Seong-Woon Choi, Sang-Gyun Woo, Jin-Min Kim, 1994, Photomask Technology.

The novel plasma etching process for defect reduction in photomask fabrication

Sang-Gyun Woo, Seong-Yong Moon, Ji-Hyun Lee, 2009, Photomask Japan.

Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Han-Ku Cho, Woo-Sung Han, Chan Hwang, 2004, SPIE Advanced Lithography.

Novel 193-nm photoresist based on Olefin-containing lactones

Joo-Tae Moon, Sang-Gyun Woo, Sung-Ho Lee, 2001, SPIE Advanced Lithography.

Side-lobe suppression in halftone PSM with optical proximity correction

In-Gyun Shin, Woo-Sung Han, Sang-Gyun Woo, 1995, Photomask Technology.

Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Sang-Gyun Woo, Eunah Kim, Young-Bum Koh, 1996, Photomask and Next Generation Lithography Mask Technology.

Advanced module-based approach to effective CD prediction of sub-100nm patterns

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Mask writing time explosion and its effect on CD control in e-beam lithography

Jin Choi, Han-Ku Cho, Sang-Gyun Woo, 2010, Photomask Japan.

Improvement of pattern collapse in sub-100 nm nodes

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2003, SPIE Advanced Lithography.

Mask topography effect on OPC at hyper-NA lithography

Han-Ku Cho, Joo-Tae Moon, Yong-Jin Chun, 2006, SPIE Advanced Lithography.

A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level

Han-Ku Cho, Sang-Gyun Woo, Jin-Sik Jung, 2008, Photomask Technology.

Fidelity comparison of island patterns with different types of illuminations and phase shift masks

Woo-Sung Han, Sang-Gyun Woo, Seong-Yong Moon, 1995, Advanced Lithography.

Impact of illumination intensity profile on lithography simulation

Insung Kim, Han-Ku Cho, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Layer-specific illumination optimization by Monte Carlo method

Han-Ku Cho, Woo-Sung Han, Chan Hwang, 2003, SPIE Advanced Lithography.

Development of resists for thermal flow process applicable to mass production

Joo-Tae Moon, Yool Kang, Sang-Gyun Woo, 2001, SPIE Advanced Lithography.

Application of alternating phase-shifting masks to 200-nm contact holes

Sang-Gyun Woo, Chun-Geun Park, Young-Bum Koh, 1996, Photomask Technology.

Novel resist material for sub-100-nm contact hole pattern

Joo-Tae Moon, Yool Kang, Sang-Gyun Woo, 2000, Advanced Lithography.

Strategy for sub-80-nm contact hole patterning considering device fabrication

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer

Han-Ku Cho, Sang-Gyun Woo, Byung-Gook Kim, 2009, Photomask Japan.

Modified procedure for evaluation of low-k1 process windows

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

Impact of BARC on SEM shrinkage of ArF resist

Sang-Gyun Woo, Hyun-Woo Kim, Yasuyuki Nakajima, 2004, SPIE Advanced Lithography.

In-line chemical shrink process for 70 nm contact hole patterns by the room-temperature electrostatic self-assembly

Han-Ku Cho, Joo-Tae Moon, Man-Hyoung Ryoo, 2005, SPIE Advanced Lithography.

Fluorocarbon-based single-layer resist for 157-nm lithography

Woo-Sung Han, Sang-Gyun Woo, Kenji Honda, 2002, SPIE Advanced Lithography.

Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Han-Ku Cho, Dong-Hoon Chung, Hyung-Do Kim, 2003, Photomask Japan.

Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition

Sang-Gyun Woo, Jaehyuck Choi, Han-shin Lee, 2007, Photomask Japan.

Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Han-Ku Cho, Woo-Sung Han, Jin Hong, 2004, SPIE Advanced Lithography.

Requirements of nano-machining repair system for 45-nm node

Han-Ku Cho, Hyuk-Joo Kwon, Sang-Gyun Woo, 2007, Photomask Japan.

Statistical analysis of CD-SEM measurement and process control in the indistinguishable multiprocess patterns

Gi-Sung Yeo, Han-Ku Cho, Joo-Tae Moon, 2006, SPIE Advanced Lithography.

The application criterion of model-based optical proximity correction in a low k1 process

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Improvement of mask CD uniformity for below 45-nm node technology

Han-Ku Cho, Sang-Gyun Woo, Hojune Lee, 2007, SPIE Photomask Technology.

Pattern type specific modeling and correction methodology at high NA and off-axis illumination

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2005, SPIE Photomask Technology.

Mask process monitoring with optical CD measurements for sub-50-nm

Han-Ku Cho, Dong-Hoon Chung, Yong-Hoon Kim, 2008, Photomask Technology.

Improving model-based OPC performance for sub-60nm devices using real source optical model

Insung Kim, Gi-Sung Yeo, Han-Ku Cho, 2006, SPIE Advanced Lithography.

Analysis of process margin in EUV mask repair with nano-machining

Sang-Gyun Woo, Seong-Yong Moon, Jung-Hwan Lee, 2008, Photomask Technology.

The study of CD error in mid-local pattern area caused by develop loading effect

Han-Ku Cho, Jung-Hun Lee, Sang-Gyun Woo, 2007, SPIE Photomask Technology.

Spin-on hard mask with dual-BARC property for 50-nm devices

Han-Ku Cho, Joo-Tae Moon, Man-Hyoung Ryoo, 2006, SPIE Advanced Lithography.

Validation of ArF Chromeless PSM in the Sub-100 nm Node DRAM Cell

Han-Ku Cho, Dong-Hoon Chung, Woo-Sung Han, 2002, Photomask Technology.

Toward DFM: process worthy design and OPC through verification method using MEEF, TF-MEEF, and MTT

Sang-Gyun Woo, Young-Seog Kang, Sungsoo Suh, 2006, SPIE Advanced Lithography.

Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions

Woo-Sung Han, Sang-Gyun Woo, Young-Bum Koh, 1995, Photomask and Next Generation Lithography Mask Technology.

Design and synthesis of new photoresist materials for ArF lithography

Joo-Tae Moon, Sang-Gyun Woo, Hyun-woo Kim, 2000, Advanced Lithography.

Cost-effective pattern inspection system using Xe-Hg lamp in challenge of sub-65-nm node

Sang-Gyun Woo, Dong-Hoon Chung, Jinhyung Park, 2007, Photomask Japan.

Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Woo-Sung Han, Sang-Gyun Woo, Hoyoung Kang, 1996, Advanced Lithography.

Novel surface silylation process for chemically amplified photoresist

Woo-Sung Han, Jin Hong, Sang-Gyun Woo, 2002, SPIE Advanced Lithography.

Investigation on polarization monitoring mask: pattern design and experimental verification

Han-Ku Cho, Joo-Tae Moon, Chan Hwang, 2006, SPIE Advanced Lithography.

Way for LEEPL technology to succeed in memory device application

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Modification of development parameters of 193-nm chemically amplified resist with pattern density

Han-Ku Cho, Hye-Keun Oh, Nakgeuon Seong, 2001, SPIE Advanced Lithography.

Novel chemical shrinkage material for small contact hole and small space patterning

Han-Ku Cho, Man-Hyoung Ryoo, Sang-Gyun Woo, 2005, SPIE Advanced Lithography.

Implementation of the ArF resists based on VEMA for sub-100-nm device

Joo-Tae Moon, George G. Barclay, Robert J. Kavanagh, 2002, SPIE Advanced Lithography.

Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography

Sang-Gyun Woo, Yusuke Takano, Munirathna Padmanaban, 2003, SPIE Advanced Lithography.

Optical performance enhancement technique for 45-nm node with binary mask

Han-Ku Cho, Sang-Gyun Woo, Hee-Bom Kim, 2007, Photomask Japan.

Requirements of photomask registration for the 45nm node and beyond: Is it possible?

Jin Choi, Dong-Hun Lee, Sang-Gyun Woo, 2007, SPIE Photomask Technology.

Novel polymers for 193-nm single-layer resist based on cycloolefin polymers

Joo-Tae Moon, Sang-Gyun Woo, Kwang-Sub Yoon, 2000, Advanced Lithography.

A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Influence of material on process focus budget and process window of 80nm DRAM devices

Han-Ku Cho, Joo-Tae Moon, Sang-Gyun Woo, 2005, SPIE Advanced Lithography.

Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL

Sungmin Huh, Han-Ku Cho, Sang-Gyun Woo, 2008, Photomask Technology.

Study of mask structure for 45-nm node based on manufacturability and lithographic performance

Sang-Gyun Woo, Han-Ku Cho, Jong Gul Doh, 2007, Photomask Japan.

Trade-off between inverse lithography mask complexity and lithographic performance

Sang-Gyun Woo, Vikram Tolani, Guangming Xiao, 2009, Photomask Japan.

Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine

Ji-Hyeon Choi, Han-Ku Cho, Sang-Gyun Woo, 2008, Photomask Japan.

Flare-induced CD variation correction using transmittance controlled mask

Gi-Sung Yeo, Han-Ku Cho, Woo-Sung Han, 2003, SPIE Advanced Lithography.

Plasma monitoring of chrome dry etching for mask making

Dong-Chan Kim, Han-Ku Cho, Sang-Gyun Woo, 2010, Photomask Technology.

Shot based MRC flow by using full chip MRC tool

Han-Ku Cho, Sang-Gyun Woo, Sung-Hoon Jang, 2007, Photomask Japan.

Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

Han-Ku Cho, Woo-Sung Han, Jin Hong, 2003, SPIE Advanced Lithography.

Simulation and experiments for inspection properties of EUV mask defects

Han-Ku Cho, Joo-Tae Moon, Sang-Gyun Woo, 2006, Photomask Japan.

2D measurement using CD SEM for arbitrarily shaped patterns

Dong-Hoon Chung, Dong Il Shin, Sang-Gyun Woo, 2007, SPIE Photomask Technology.

Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Gi-Sung Yeo, Han-Ku Cho, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Application of alternating phase shift mask to device fabrication

Woo-Sung Han, Sang-Gyun Woo, Sung-Gi Kim, 1995, Advanced Lithography.

Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device

Jin Choi, Sang-Gyun Woo, Hee Bom Kim, 2010, Photomask Japan.

Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Han-Ku Cho, Joo-Tae Moon, Sang-Gyun Woo, 2005, SPIE Advanced Lithography.

Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Jeroen Van de Kerkhove, Han-Ku Cho, Joo-Tae Moon, 2006, European Mask and Lithography Conference.

Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design

Han-Ku Cho, Woo-Sung Han, Chan Hwang, 2003, SPIE Advanced Lithography.

E-beam shot count estimation at 32 nm HP and beyond

Jin Choi, Sang-Gyun Woo, Sanghee Lee, 2009, Photomask Japan.

Defect inspection of EUV mask blank using confocal microscopy: simulation and experiment

Han-Ku Cho, Joo-Tae Moon, Sang-Gyun Woo, 2006, SPIE Advanced Lithography.

Predicting conversion time of circuit design file by artificial neural networks

Ji-Hyeon Choi, Han-Ku Cho, Jee-Hyong Lee, 2008, SPIE Advanced Lithography.

Shifter slope variation effect of embedded half-tone phase-shift masks

Woo-Sung Han, Sang-Gyun Woo, Seong-Yong Moon, 1995, Photomask Technology.

A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability

Jinhyung Park, Sang-Gyun Woo, Dong-Hoon Chung, 2007, SPIE Photomask Technology.

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Macro analysis of line edge and line width roughness

Han-Ku Cho, Joo-Tae Moon, Sang-Gyun Woo, 2006, SPIE Advanced Lithography.

Stability of CrFx films for phase-shifting mask

Sang-Gyun Woo, Eunah Kim, Young-Bum Koh, 1997, Photomask and Next Generation Lithography Mask Technology.

Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Han-Ku Cho, Sang-Gyun Woo, Seong-Sue Kim, 2005, SPIE Advanced Lithography.

Evaluation of puddle time effect and optimization of development process in 193-nm lithography

Han-Ku Cho, Woo-Sung Han, Hyung-Rae Lee, 2004, SPIE Advanced Lithography.

Effects of gas ring position and mesh introduction on film quality and thickness uniformity

Sang-Gyun Woo, Young-Bum Koh, Byeong-Soo Bae, 1997 .

Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193nm photolithography: Top-down meets bottom-up

Han-Ku Cho, Joo-Tae Moon, Man-Hyoung Ryoo, 2006 .

Understanding the impact of source displacement error on sub-90 nm patterns using a fresnel zone plate

Han-Ku Cho, Joo-Tae Moon, Chan Hwang, 2005 .

Flare in Microlithographic Exposure Tools

Woo-Sung Han, Jung-Min Sohn, Sung-Woon Choi, 2002 .

Effects of SF_6 Addition to O_2 Plasma on Polyimide Etching

Sang-Gyun Woo, Jinho Ahn, Sanghoon Kim, 2000 .

Resist charging effect in photomask: Its impact on pattern placement error and critical dimension

Han-Ku Cho, Sang-Gyun Woo, Byung-Gook Kim, 2008 .