Yew Tong Yeow

High-quality sub-5-nm oxynitride dielectric films grown on silicon in a nitric oxide ambient using rapid thermal processing

H. Barry Harrison, Sima Dimitrijev, Z.-Q. Yao, 1994, Advanced Lithography.

High field stress induced leakage current in 3.0-nm NO-grown gate dielectric films

Sima Dimitrijev, Herbert Barry Harrison, Z.-Q. Yao, 1995, 1995 IEEE TENCON. IEEE Region 10 International Conference on Microelectronics and VLSI. 'Asia-Pacific Microelectronics 2000'. Proceedings.

Dielectrics on Silicon Thermally Grown or Annealed in a Nitrogen Rich Environment

H. B. Harrison, H. Barry Harrison, Sima Dimitrijev, 1994 .

Extraction of MOSFET threshold voltage, series resistance, effective channel length, and inversion layer mobility from small-signal channel conductance measurement

Yew Tong Yeow, F.C.J. Kong, Z. Q. Yao, 2001 .

High quality ultrathin dielectric films grown on silicon in a nitric oxide ambient

H. B. Harrison, Sima Dimitrijev, Herbert Barry Harrison, 1994 .