Sven Van Elshocht

(Invited) Plasma Enhanced Atomic Layer Deposited Ruthenium for MIMCAP Applications

K. Opsomer, L. Altimime, J. Kittl, 2011 .

Dielectric Response of Ta2O5, NbTaO5 and Nb2O5 from First-Principles Investigations

G. Pourtois, S. Clima, D. Wouters, 2009 .

Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories

Christoph Adelmann, Thomas Mikolajick, Uwe Schroeder, 2013, 2013 Proceedings of the European Solid-State Device Research Conference (ESSDERC).