Takane Yamada

Strain relaxation process and evolution of crystalline morphologies during the growths of SiGe on Si(110) by solid-source molecular beam epitaxy

K. Nakagawa, S. Saito, J. Yamanaka, 2020 .

Feasibility Study to Evaluate Lattice-Space Changing of a Step-Graded SiGe/Si (110) Using STEM Moiré

K. Nakagawa, K. Ishizuka, A. Ishizuka, 2018 .