George Hwa

发表

Automated Defect Classification (ADC) and Progression Monitoring (DPM) in wafer fab reticle requalification

Vikram Tolani, Bill Wang, Peter Hu, 2013, Photomask Technology.

Lithographic plane review (LPR) for sub-32nm mask defect disposition

Vikram Tolani, Linyong Pang, Noel Corcoran, 2010, Photomask Technology.

Computational defect review for wafer-fab reticle requal, part 1: mask plane inspections

Ying Li, Vikram Tolani, Linyong Pang, 2012, Photomask Technology.

Reticle decision center: a novel applications platform for enhancing reticle yield and productivity at 10nm technology and beyond

Chun-Jen Chen, Vikram Tolani, Laurent C. Tuo, 2016, Photomask Technology.

Need for comprehensive reticle data management and analytics

Masaki Satake, Vikram Tolani, Peter Liu, 2020, Photomask Technology.