文
论文分享
演练场
杂货铺
论文推荐
字
编辑器下载
登录
注册
W. Shimizu
发表
Effect of oxygen concentration on the spike formation during reactive ion etching of SiC using the mixed gas plasma of NF3 and O2
T. Abe, M. Inaba, Z. Ogumi, 2007 .
Plasma etching of SiC surface using NF3
T. Abe, M. Inaba, Z. Ogumi, 2002 .