Li-Chi Peng

ZrO2-HfO2 Superlattice Ferroelectric Capacitors With Optimized Annealing to Achieve Extremely High Polarization Stability

Y. Chu, S. Yeong, Chun-Hsiung Lin, 2022, IEEE Electron Device Letters.

Electrical Characteristics of Ultrathin InZnO Thin-Film Transistors Prepared by Atomic Layer Deposition

Po-Tsun Liu, S. Yeong, C. Kei, 2023, IEEE Transactions on Electron Devices.

Aggressively Scaled Atomic Layer Deposited Amorphous InZnOx Thin Film Transistor Exhibiting Prominent Short Channel Characteristics (SS= 69 mV/dec.; DIBL = 27.8 mV/V) and High Gm(802 μS/μm at VDS = 2V)

T. Chao, Y. Tseng, C. Kei, 2023, 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits).