L. Depoyan

Grayscale lithography process study applied to zero-gap microlenses for sub-2μm CMOS image sensors

S. Audran, J. Vaillant, V. Farys, 2010, Advanced Lithography.

0.13μm SiGe BiCMOS technology for mm-wave applications

P. Chevalier, L. Depoyan, D. Dutartre, 2008, 2008 IEEE Bipolar/BiCMOS Circuits and Technology Meeting.

0.13 $\mu$ m SiGe BiCMOS Technology Fully Dedicated to mm-Wave Applications

Alain Chantre, Daniel Gloria, Pascal Chevalier, 2009, IEEE Journal of Solid-State Circuits.

A conventional double-polysilicon FSA-SEG Si/SiGe:C HBT reaching 400 GHz fMAX

D. Celi, P. Chevalier, C. Gaquiere, 2009, 2009 IEEE Bipolar/BiCMOS Circuits and Technology Meeting.