T. Struck

发表

Inter- and Intra-Organisational Barriers to Sharing Knowledge in the Extended Supply-Chain

Svetan Ratchev, Frithjof Weber, Thomas Struck, 2000 .

Progress in placement control for ion beam stencil mask technology

Joerg Butschke, Thomas Struck, Ernst Haugeneder, 2001, SPIE Advanced Lithography.

Comparison of silicon stencil mask distortion measurements with finite element analysis

Roxann L. Engelstad, Edward G. Lovell, Joerg Butschke, 1999 .

Stencil mask technology for ion beam lithography

Hans Loeschner, Ivo W. Rangelow, Joerg Butschke, 1998, Photomask Technology.