D. White

A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1999 .

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1997 .

MMST manufacturing technology-hardware, sensors, and processes

Maureen A. Hanratty, S. O'Brien, G. G. Barna, 1994 .

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor ETCH Process: Impact of Measurement Selection and Data Treatment on Sensitivity

Barry M. Wise, Neal B. Gallagher, S. W. Butler, 1997 .