Dennis W. Hess

Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.

J. W. Coburn, R. A. Gottscho, Dennis W. Hess, 1986 .

Silicon Oxidation During Bilayer Resist Etching

Robert D. Allen, Dennis W. Hess, David S. Soane, 1989, Advanced Lithography.

Dissolution And Swelling Studies Of Poly(Methyl Methacrylate) Resist Films

Alexis T. Bell, David S. Soong, Dennis W. Hess, 1987, Advanced Lithography.

Proceedings of the Tutorial Symposium on Semiconductor Technology

Insulation Division, Dennis W. Hess, Daryl Ann Doane, 1982 .

Plasma-assisted oxidation, anodization, and nitridation of silicon

Dennis W. Hess, D. Hess, 1999, IBM J. Res. Dev..

Study of silylation mechanisms and kinetics through variations in silylating agent and resin

Chris A. Spence, Dennis W. Hess, T. Teresa Dao, 1991, Other Conferences.