Dave Gerold

A new methodology for quantifying OPC recipe accuracy

Robert Lugg, Frank Amoroso, David Ziger, 2005, SPIE Photomask Technology.

Poled electro-optic photolime gel polymer doped with chlorophenol red and bromomethyl-blue chromophores

Ray T. Chen, David G. Pelka, Dave Gerold, 1994, Optics & Photonics.

65nm mask CD qualification on critical features through simulation based lithography verification

Paul J. M. van Adrichem, David Ziger, Dave Gerold, 2005, Photomask Japan.

Comparing traditional OPC to field-based OPC for 45-nm node production

Kevin Lucas, Robert Lugg, Josh Tuttle, 2007, SPIE Advanced Lithography.

Vacuum-tuned graded index polymer waveguides on silicon substrates

Ray T. Chen, Dave Gerold, 1994, Optics & Photonics.