Elliott Franke

Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

Nelson Felix, Kafai Lai, Chi-Chun Liu, 2018, Nature Electronics.

DSA patterning options for FinFET formation at 7nm node

Akiteru Ko, Nelson Felix, Mark Somervell, 2016, SPIE Advanced Lithography.

Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

D. Corliss, K. Lai, N. Felix, 2018, Nature Electronics.

DSA patterning options for logics and memory applications

Akiteru Ko, John Arnold, Nelson Felix, 2017, Advanced Lithography.

Multi-color fly-cut-SAQP for reduced process variation

Richard A. Farrell, Peter Biolsi, David Hetzer, 2018, Advanced Lithography.

Fin formation using graphoepitaxy DSA for FinFET device fabrication

Akiteru Ko, Nelson Felix, Nihar Mohanty, 2015, Advanced Lithography.