C. Chi

Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

Nelson Felix, Kafai Lai, Chi-Chun Liu, 2018, Nature Electronics.

LCDU improvement of EUV-patterned vias with DSA

Daniel A. Corliss, Chi-Chun Liu, Yann Mignot, 2019, Advanced Lithography.

Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

D. Corliss, K. Lai, N. Felix, 2018, Nature Electronics.

Strategies to enable directed self-assembly contact hole shrink for tight pitches

Nelson Felix, Martha I. Sanchez, Cheng Chi, 2016, SPIE Advanced Lithography.

DSA patterning options for logics and memory applications

Akiteru Ko, John Arnold, Nelson Felix, 2017, Advanced Lithography.

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

Yongan Xu, John Arnold, Nelson Felix, 2017, Advanced Lithography.

DSA via hole shrink for advanced node applications

Nelson Felix, Kafai Lai, Martha I. Sanchez, 2016, SPIE Advanced Lithography.

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Nelson Felix, Markus Brink, Chi-Chun Liu, 2017 .