Carmen Popescu

Highly substituted fullerene-based spin-on organic hardmasks

Warren Montgomery, Alan G. Brown, Guy Dawson, 2020, Advanced Lithography.

Multi-trigger resist for electron beam lithography

John Roth, Yasin Ekinci, Guy Dawson, 2017, European Mask and Lithography Conference.

Performance enhancements with high opacity multi-trigger resist

John Roth, Tom Lada, Alexandra McClelland, 2020, Advanced Lithography.

Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography

Andreas Frommhold, Yasin Ekinci, John Roth, 2017, Advanced Lithography.

Multi-trigger resist for electron beam and extreme ultraviolet lithography

John Roth, Yasin Ekinci, Guy Dawson, 2018, European Mask and Lithography Conference.