Shinsuke Nishimura

Stage tracking of a mask-scan EB mask writer test stand

Jun Takamatsu, Seiichi Tsuchiya, Munehiro Ogasawara, 2002, SPIE Photomask Technology.

New electron optics for mask writer EBM-7000 to challenge hp 32nm generation

Takashi Kamikubo, Munehiro Ogasawara, Shuichi Tamamushi, 2008, Photomask Technology.

Development of an in-situ cleaning system for an e-beam reticle writer

Ryoichi Hirano, Munehiro Ogasawara, Toru Tojo, 1997, Photomask and Next Generation Lithography Mask Technology.

Improvement of beam-adjustment accuracy by beam-intensity distribution measurement on a second shaping aperture in electron-beam writing systems

Munehiro Ogasawara, Toru Tojo, Shinsuke Nishimura, 2001, SPIE Advanced Lithography.