H. Nomura

Multi-beam mask writer MBM-2000PLUS

Keisuke Yamaguchi, Hiroshi Matsumoto, Hayato Kimura, 2022, Advanced Lithography.

Study on modeling of resist surface charge effect on mask blanks with charge dissipation layer in electron beam mask writers

Haruyuki Nomura, Takashi Kamikubo, Noriaki Nakayamada, 2021, Photomask Technology.

Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers

Haruyuki Nomura, Noriaki Nakayamada, Kenji Ohtoshi, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Electron beam mask writer EBM-9500 for logic 7nm node generation

Kenichi Saito, Haruyuki Nomura, Takashi Kamikubo, 2016, Photomask Technology.