Ulrich Wegmann

Nachhaltigkeit als Leitbild eines globalen Kohle-Konzerns

Günter Dach, Ulrich Wegmann, 2001 .

Optimizing and enhancing optical systems to meet the low k1 challenge

Jo Finders, Oscar Noordman, Jan Baselmans, 2003, SPIE Advanced Lithography.

Real-time wavefront measurement with lambda/10 fringe spacing for the optical shop

Karl-Heinz Schuster, Klaus R. Freischlad, Michael F. Kuechel, 1991, Optics & Photonics.

Toward a comprehensive control of full-field image quality in optical photolithography

Michael Arnz, Guy Davies, Jos de Klerk, 1997, Advanced Lithography.

Strategy of a Global Coal Company for Sustainable Development

Ulrich Wegmann, Günter Dach, 2002 .

Software concept for the new Zeiss interferometer

Bernd Doerband, Ulrich Wegmann, Wolfgang Wiedmann, 1991, Optics & Photonics.

Method and apparatus for correcting errors in an euv lithography system

Ulrich Wegmann, Sergey Oshemkov, Markus Mengel, 2011 .