Ahmad Kermani

Single-wafer integrated processing as a manufacturing tool using rapid thermal chemical vapor deposition technology

Ahmad Kermani, 1991, Other Conferences.

Control of polysilicon emitter interface using RTCVD

B. Jalali, Ahmad Kermani, 1992, Other Conferences.

The Application of Rapid Thermal Chemical Vapor Deposition of Doped-Thin Single Crystal Silicon for MOS and Bipolar Technologies.

Ahmad Kermani, F. Wong, Yen-Hui Ku, 1990, Other Conferences.

The application of computational simulation to design optimization of an axisymmetric rapid thermal processing system

Paul A. Spence, W. S. Winters, Ahmad Kermani, 1994 .

Concurrent design of an RTP chamber and advanced control system

Charles D. Schaper, Paul A. Spence, Ahmad Kermani, 1995 .

A Universal Thermal Module™ for Clusterable RTP and MOCVD Applications

Charles D. Schaper, Mehrdad M. Moslehi, Ahmad Kermani, 1995 .

Nitridation and post-nitridation anneals of SiO/sub 2/ for ultrathin dielectrics

Krishna C. Saraswat, P. J. Wright, Ahmad Kermani, 1990 .