Tadashi Otaka

Effect of various ArF resist shrinkage amplitudes on CD bias

Takashi Iizumi, Burn Jeng Lin, Chih-Ming Ke, 2002, SPIE Advanced Lithography.

Development of critical dimension measurement scanning electron microscope for ULSI (S-8000 series)

Hideo Todokoro, Tadashi Otaka, Makoto Ezumi, 1996, Advanced Lithography.

Nanometer-level metrology with a low-voltage CD SEM

Tsuneo Terasawa, Jiro Yamamoto, Hideo Todokoro, 1998, Advanced Lithography.

Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Hiroki Kawada, Burn Jeng Lin, Chih-Ming Ke, 2004, SPIE Advanced Lithography.

Prospects for using primary electron-based CD metrology

Bryan J. Rice, Shunsuke Koshihara, Jeanette M. Roberts, 2004, SPIE Advanced Lithography.

Observation of subsurface structures using high-energy SEM

Hideo Todokoro, Miyako Matsui, Aritoshi Sugimoto, 2005, SPIE Advanced Lithography.