Katsuyuki Sekine

Film composition and its profile control of hfsion for poly-Su gate cmosfet with high performance and reliability

Yoshitaka Tsunashima, Motoyuki Sato, Takashi Watanabe, 2005 .

Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing

Masakazu Goto, Kikuo Yamabe, Yuichiro Mitani, 2013, Microelectron. Reliab..

The operation condition of the sludge regenerated management center in Furano City, Hokkaido

Katsuyuki Sekine, Toshio Satou, Masao Satou, 2004 .

iFL: An interactive environment for understanding feature implementations

Shinpei Hayashi, Motoshi Saeki, Katsuyuki Sekine, 2010, 2010 IEEE International Conference on Software Maintenance.

Effects of Nitrogen Concentration and Post-treatment on Reliability of HfSiON Gate Dielectrics in Inversion States

Yoshitaka Tsunashima, Kazuhiro Eguchi, Katsuyuki Sekine, 2005 .