Seiji Inumiya

Film composition and its profile control of hfsion for poly-Su gate cmosfet with high performance and reliability

Yoshitaka Tsunashima, Motoyuki Sato, Takashi Watanabe, 2005 .

Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing

Masakazu Goto, Kikuo Yamabe, Yuichiro Mitani, 2013, Microelectron. Reliab..

Evaluation of Dielectric Reliability of Ultrathin HfSiOxNy in Metal-Gate Capacitors

Seiichiro Higashi, Seiichi Miyazaki, Yasuo Nara, 2007, IEICE Trans. Electron..

Evaluation of Dielectric Reliability of Ultrathin HfSiO_xN_y in Metal Gate Capacitors(Session 9A Silicon Devices VI,AWAD2006)

Hideki Murakami, Seiichiro Higashi, Seiichi Miyazaki, 2006 .

High performance damascene metal gate MOSFETs for 0.1 /spl mu/m regime

Yoshitaka Tsunashima, Katsuhiko Hieda, Y. Akasaka, 2000 .

Improvement of threshold voltage deviation in damascene metal gate transistors

Yoshitaka Tsunashima, Tsuyoshi Shibata, Atsushi Yagishita, 2001 .