Yao-Ching Ku

发表

Thin film 193nm TNK measurement using multi-domain genetic algorithm (MDGA) with a combination of beam profile reflectometry (BPR), absolute ellipsometry (AE), and spectroscopic ellipsometry (SE)

Chih-Ming Ke, Pei-Hung Chen, Jeng-Horng Chen, 2003, SPIE Optics + Photonics.

New negative resist design with novel photo-base generator

Ching-Yu Chang, Yu-Chang Su, Cheng-Han Wu, 2013, Advanced Lithography.

Patterning effect and correlated electrical model of post-OPC MOSFET devices

Ru-Gun Liu, Wen-Yun Wang, Wen-Chun Huang, 2007, SPIE Advanced Lithography.

Fabrication of distortion free x-ray masks using low stress tungsten

Yao-Ching Ku, 1991 .

90-nm lithography process characterization using ODP scatterometry technology

Wenge Yang, Jacky Huang, Chih-Ming Ke, 2004, SPIE Advanced Lithography.

Contrast improvement with balanced diffusion control of PAG and PDB

Yao-Ching Ku, Ya-Hui Chang, C. C. Huang, 2012, Other Conferences.

Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Hiroki Kawada, Burn Jeng Lin, Chih-Ming Ke, 2004, SPIE Advanced Lithography.

Effective resist profile control

Chien-Wei Wang, Ching-Yu Chang, Yao-Ching Ku, 2014, Advanced Lithography.

A study of conductive material for e-beam lithography

Shy-Jay Lin, Burn Jeng Lin, Ching-Yu Chang, 2011, Advanced Lithography.

In situ stress monitoring and deposition of zero‐stress W for x‐ray masks

I. Plotnik, Yao-Ching Ku, Henry I. Smith, 1991 .

Fabrication and characterization of high-flatness mesa-etched silicon nitride x-ray masks

Mark L. Schattenburg, Yao-Ching Ku, Henry I. Smith, 1991 .

Fabrication and testing of 0.1‐μm‐linewidth microgap x‐ray masks

Mark L. Schattenburg, Darryl W. Peters, Robert D. Frankel, 1990 .

Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles

Burn Jeng Lin, Anthony Yen, Chih-Ming Ke, 2005 .