Wei Yuan

Can optical proximity correction solution be learned? The learning limit and a general learning framework

X. Shi, Chen Li, Yan Yan, 2022, Journal of Micro/Nanopatterning, Materials, and Metrology.

Optimal feature vector design for computational lithography

Wei Yuan, Yanjun Xiao, Ming Li, 2019, Advanced Lithography.

DFM: “Design for Manufacturing” or “Design Friendly Manufacturing”

Wenzhan Zhou, Xiang Peng, Yu Zhang, 2019, Journal of Microelectronic Manufacturing.

Machine learning virtual SEM metrology and SEM-based OPC model methodology

Xuelong Shi, Yan Yan, Wei Yuan, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Accurate etch modeling with massive metrology and deep-learning technology

Yuhang Zhao, Weijun Wang, Yiqiong Zhao, 2020 .