Kyle Patterson

Dissolution behavior of fluoroalcohol-substituted polystyrenes

Brian Osborn, C. Grant Willson, Sean D. Burns, 2001, SPIE Advanced Lithography.

Polymers for 157-nm photoresist applications: a progress report

Jeff D. Byers, Brian Osborn, C. Grant Willson, 2000, Advanced Lithography.

Line-edge roughness reduction and CD slimming using hardback processing

Frieda Van Roey, Jonathan L. Cobb, Monique Ercken, 2003, SPIE Advanced Lithography.

Critical failure ORC: Improving model accuracy through enhanced model generation

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2006 .

Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness

Brian Osborn, C. Grant Willson, Mark Somervell, 2000, Advanced Lithography.

Design and study of water-soluble positive- and negative-tone imaging materials

C. Grant Willson, Jean M. J. Fréchet, David R. Medeiros, 1998, Advanced Lithography.

High accuracy 65nm OPC verification: full process window model vs. critical failure ORC

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2004, SPIE Advanced Lithography.

Positive- and negative-tone water-processable photoresists: a progress report

C. Grant Willson, Jean M. J. Fréchet, Qinghuang Lin, 1998, Advanced Lithography.