Geoffrey Burr

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

Kafai Lai, Scott Halle, Aasutosh Dave, 2010, Advanced Lithography.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.