Young Kim

发表

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

Kafai Lai, Scott Halle, Aasutosh Dave, 2010, Advanced Lithography.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Applicability of global source mask optimization to 22/20nm node and beyond

Aasutosh Dave, Jason Meiring, Gabriel Berger, 2011, Advanced Lithography.

A FRAMEWORK FOR PERFORMANCE ANALYSIS OF DISPATCHING RULES IN MANUFACTURING SYSTEMS

Yun Bae Kim, Hyun-Jung Kim, Jun Kim, 2018, 2018 Winter Simulation Conference (WSC).