Moutaz Fakhry

发表

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

Kafai Lai, Scott Halle, Aasutosh Dave, 2010, Advanced Lithography.

Optimization of process window simulations for litho-friendly design framework

Andres Torres, Mohamed Al-Imam, Rami Fathy, 2006, SPIE Photomask Technology.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Total source mask optimization: high-capacity, resist modeling, and production-ready mask solution

Yuri Granik, Kafai Lai, Kostas Adam, 2011, Photomask Technology.

Pattern-based DTCO flow for early estimation of lithographic difficulty using optical image processing

Kareem Madkour, Jason P. Cain, Wael ElManhawy, 2016, SPIE Advanced Lithography.

Pattern-aware diagnostics: using high-performance pattern analysis to identify defect root cause (Conference Presentation)

Frank E. Gennari, Ya-Chieh Lai, Piyush Pathak, 2019 .

Applying machine learning to pattern analysis for automated in-design layout optimization

Frank E. Gennari, Jason Sweis, Ya-Chieh Lai, 2018, Advanced Lithography.

Introducing process variability score for process window OPC optimization

A. Seoud, Moutaz Fakhry, H. Maaty, 2009, Photomask Technology.

Applicability of global source mask optimization to 22/20nm node and beyond

Aasutosh Dave, Jason Meiring, Gabriel Berger, 2011, Advanced Lithography.

Litho friendly via insertion with in-design auto-fix flow using machine learning

Fadi Batarseh, Jason P. Cain, Nishant Shah, 2018, Advanced Lithography.

Pattern-based analytics to estimate and track yield risk of designs down to 7nm

Frank E. Gennari, Jason Sweis, Ya-Chieh Lai, 2017, Advanced Lithography.