Takahiro Kozawa

发表

Single component chemically-amplified resist based on dehalogenation of polymer

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2007, SPIE Advanced Lithography.

Acid proliferation to improve the sensitivity of EUV resists: a pulse radiolysis study

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2011, Advanced Lithography.

Analysis of resist patterns for material and process design: parameter extraction from dose pitch matrices of line-width and edge roughness and cross-sectional SEM images

Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa, 2011, Advanced Lithography.

Study on photochemical analysis system (VLES) for EUV lithography

Takahiro Kozawa, Atsushi Sekiguchi, Yoshiyuki Kono, 2007, SPIE Advanced Lithography.

Organic solvent-free sugar-based transparency nanopatterning material derived from biomass for eco-friendly optical biochips using green lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014, Photonics Europe.

The reaction mechanism of poly[4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene]

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2006, SPIE Advanced Lithography.

Deprotonation mechanism of poly(styrene-acrylate)-based chemically amplified resist

Takahiro Kozawa, Seiichi Tagawa, Takashi Sumiyoshi, 2011, Advanced Lithography.

Evaluation of novel hydrophilic derivatives for chemically amplified EUV resists

Hiroki Yamamoto, Takahiro Kozawa, Hiroyasu Tanaka, 2014, Advanced Lithography.

Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using machine learning

Takahiro Kozawa, Kazuki Azumagawa, 2020, Advanced Lithography.

Reactivity of model compounds of ArF immersion, ArF, and KrF resists with diphenylsulfinyl radical cation, a cage-escape product of photochemistry of triphenylsulfonium salts

Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa, 2006, SPIE Advanced Lithography.

Tri-layer resist process for fabricating sub 45-nm L&S patterns by EPL

Kazuyuki Matsumaro, Fumihiro Koba, Takahiro Kozawa, 2006, SPIE Advanced Lithography.

Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography

Hiroki Yamamoto, Takahiro Kozawa, Kazumasa Okamoto, 2015, Other Conferences.

Study on dissolution behavior of polymer-bound and polymer-blended photo-acid generator (PAG) resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2013, Advanced Lithography.

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

Hiroki Yamamoto, Takahiro Kozawa, Kazuo Kobayashi, 2014, Advanced Lithography.

Base quencher effects in chemically amplified resist at sub-30-nm fabrication

Minoru Toriumi, Julius Joseph Santillan, Toshiro Itani, 2008, SPIE Advanced Lithography.

Evaluation of adamantane derivatives for chemically amplified resist: a comparison between ArF, EUV, and EB exposures

Takahiro Kozawa, Seiichi Tagawa, Kikuo Furukawa, 2008, SPIE Advanced Lithography.

Fundamental study on reaction mechanisms in chemically amplified extreme ultraviolet resists by using 61nm free-electron laser

Takashi Kameshima, Takahiro Kozawa, Takashi Sumiyoshi, 2011, Advanced Lithography.

Negative-tone chemically amplified molecular resist based on novel fullerene derivative for nanolithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2010, Advanced Lithography.

Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement

Geert Vandenberghe, Danilo De Simone, Takahiro Kozawa, 2018 .

Characterization of EUV irradiation effects on polystyrene derivatives studied by x-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS)

Takahiro Kozawa, Seiichi Tagawa, Hiroki Yamamoto, 2011, Advanced Lithography.

Modeling and simulation of acid diffusion in chemically amplified resists with polymer-bound acid generator

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2012, Advanced Lithography.

Synthesis of metal nanoparticle and patterning in polymeric films induced by electron beam

Takahiro Kozawa, Seiichi Tagawa, Hiroki Yamamoto, 2017, Advanced Lithography.

Strategy for the breakthrough of RLS trade-off relationship in the development of novel resist materials and a developer

Takahiro Kozawa, Manabu Hoshino, Ayako Nakajima, 2019, Photomask Technology.

Evaluation of novel lactone derivatives for chemically amplified EUV resists

Hiroki Yamamoto, Takahiro Kozawa, Hiroyasu Tanaka, 2015, Advanced Lithography.

Evaluation of alcoholic hydroxyl derivatives for chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Kikuo Furukawa, 2009, Advanced Lithography.

Analysis of trade-off relationships in resist patterns delineated using SFET of Selete

Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa, 2010, Advanced Lithography.

Development of plant-based resist materials in electron beam lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2011, Advanced Lithography.

Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2015, Advanced Lithography.

Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2006, SPIE Advanced Lithography.

Improvement of dual insolubilization resist performance through the incorporation of various functional units

Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, 2019, Advanced Lithography.

Evaluation of hydroxyl derivatives for chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Hiroki Yamamoto, 2010, Advanced Lithography.

Dynamics of poly(4-hydroxystyrene) radical cation

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2008, SPIE Advanced Lithography.

Relationship between stochastic effect and resist pattern defect in extreme ultraviolet lithography

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2013, Advanced Lithography.

Stochastic effects in fabrication of 11nm line-and-space patterns using extreme ultraviolet lithography

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2014, Advanced Lithography.

Acid-base equilibrium in chemically amplified resist

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2008, SPIE Advanced Lithography.

Fluidity dependence of deprotonation kinetics of chemically amplified resist

Hiroki Yamamoto, Takahiro Kozawa, Takuya Ishida, 2014, Advanced Lithography.

Effects of low-molecular weight resist components on dissolution behavior of chemically amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance

Hiroki Yamamoto, Takahiro Kozawa, Masaki Mitsuyasu, 2015, Advanced Lithography.

Ellipsometrical detection of optical trapped nanoparticles by periodically localized light

Hiroki Yamamoto, Takahiro Kozawa, Yasuhiro Mizutani, 2012, Photonics Europe.

Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2010, Advanced Lithography.

Basic aspects of acid generation processes in chemically amplified resists for electron beam lithography

Takahiro Kozawa, Seiichi Tagawa, 2005, SPIE Advanced Lithography.

EB and EUV lithography using inedible cellulose-based biomass resist material

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2016, SPIE Advanced Lithography.

High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2015, Advanced Lithography.

Characterization of chemically amplified resists for electron beam lithography

Hiroki Yamamoto, Takahiro Kozawa, Wen-Chuan Wang, 2014, Advanced Lithography.

Chemically amplified molecular resist based on fullerene derivative for nanolithography

Takahiro Kozawa, Seiichi Tagawa, Katsumi Ohmori, 2008, SPIE Advanced Lithography.

EUV resist simulation based on process parameters of pattern formation reaction

Toshiro Itani, Takahiro Kozawa, Norihiko Sugie, 2014, Advanced Lithography.

Deprotonation mechanism of ionized poly(4-hydroxystyrene)

Hiroki Yamamoto, Takahiro Kozawa, Takuya Ishida, 2014, Advanced Lithography.

Development of water-developable resist material derived from biomass in EB lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2012, Photonics Europe.

UPGRADE OF THE L-BAND LINAC AT ISIR, OSAKA UNIVERSITY FOR HIGHER OPERATIONAL STABILITY

Takahiro Kozawa, Shigeru Kashiwagi, Goro Isoyama, 2004 .

Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, 2008, SPIE Advanced Lithography.

Development of novel protecting derivatives for chemically amplified extreme ultraviolet resist

Hiroki Yamamoto, Takahiro Kozawa, Hiroyasu Tanaka, 2014, Advanced Lithography.

Fundamental study on dissolution behavior of poly(methyl methacrylate) by quartz crystal microbalance

Hiroki Yamamoto, Takahiro Kozawa, Shusuke Yoshitake, 2016, SPIE Advanced Lithography.

Sensitivity enhancement of chemically amplified EUV resist by adding diphenyl sulfone derivatives

Takahiro Kozawa, Kazumasa Okamoto, Shunpei Kawai, 2020, Advanced Lithography.

Study of electron beam and extreme ultraviolet resist utilizing polarity change and radical crosslinking

Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, 2018, Advanced Lithography.

Study on resist performance of chemically amplified molecular resist based on noria derivative and calixarene derivative

Hiroki Yamamoto, Takahiro Kozawa, Hiroto Kudo, 2014, Advanced Lithography.

Electron and hole transfer in anion-bound chemically amplified resists used in extreme ultraviolet lithography

Hiroki Yamamoto, Takahiro Kozawa, Katsumi Ohmori, 2014, Advanced Lithography.

Lamellar orientation of block copolymer using polarity switch of nitrophenyl self-assembled monolayer induced by electron beam

Takahiro Kozawa, Guy Dawson, Alex P. G. Robinson, 2017, Advanced Lithography.

Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement

Geert Vandenberghe, Danilo De Simone, Takahiro Kozawa, 2018, Advanced Lithography.

Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014, Photonics Europe.

Study on stochastic phenomena induced in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist (high performance model resist for extreme ultraviolet lithography)

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2016, SPIE Advanced Lithography.

Dissolution kinetics and deprotection reaction in chemically amplified resists upon exposure to extreme ultraviolet radiation

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2009, Advanced Lithography.

Radiation and photochemistry of onium salt acid generators in chemically amplified resists

Takahiro Kozawa, Seiichi Tagawa, Seiji Nagahara, 2000, Advanced Lithography.

Dependence of acid generation efficiency on acid molecular structure and concentration of acid generator in chemically amplified EUV resist

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, 2008, SPIE Advanced Lithography.

Deprotonation mechanism of poly(4-hydroxystyrene) and its derivative

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2005, SPIE Advanced Lithography.

EUV lithography using water-developable resist material derived from biomass

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2013, Advanced Lithography.

Analysis of dissolution kinetics of poly(4-hydroxystyrene) with different molecular weight distributions in alkaline aqueous solution using machine learning

Takahiro Kozawa, Kazuki Azumagawa, Daisuke Kawana, 2021, Advanced Lithography.

Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes

Takahiro Kozawa, Kazuki Azumagawa, 2021, Advanced Lithography.

Theoretical Study of Exposure Latitude of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Takahiro Kozawa, Seiichi Tagawa, 2011 .

Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography

Takahiro Kozawa, Seiichi Tagawa, Yoichi Yoshida, 2003 .

Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons

Takahiro Kozawa, Seiichi Tagawa, Tsutomu Shimokawa, 2006 .

Radiation Chemistry of Triphenylsulfonium Salts in EB and X-Ray Chemically Amplified Resists

Takahiro Kozawa, Seiichi Tagawa, Seiji Nagahara, 1998 .

Dynamics of Radical Cation of Poly(4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2009 .

Image Formation in Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation

Takahiro Kozawa, Seiichi Tagawa, 2009 .

Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication

Minoru Toriumi, Julius Joseph Santillan, Toshiro Itani, 2008 .

Relationship between sensitizer concentration and resist performance of chemically amplified extreme ultraviolet resists in sub-10 nm half-pitch resolution region

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2017 .

Basic Aspects of Acid Generation Processes in Chemically Amplified Electron Beam Resist

Takahiro Kozawa, Seiichi Tagawa, 2005 .

Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2011 .

Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2004 .

Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2013 .

Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation

Takahiro Kozawa, 2012 .

Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2008 .

Quencher diffusion in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2015 .

Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2014 .

Deprotonation of Poly(4-hydroxystyrene) Intermediates: Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2013 .

Pulse radiolysis of polystyrene in cyclohexane – Effect of carbon tetrachloride on kinetic dynamics of dimer radical cation−

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2006 .

Electron beam effects on blue luminescence of zinc-doped GaN

Takahiro Kozawa, Yoshikazu Ishii, Isamu Akasaki, 1988 .

Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist

Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa, 2010 .

Study on radiation chemistry of fluorinated polymers for EUV resist

Hiroki Yamamoto, Takahiro Kozawa, Kazumasa Okamoto, 2015 .

Study on acid generation from polymer

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2005 .

Study on dissolution behavior of polymer-bound and polymer-blended photo acid generator (PAG) resists by using quartz crystal microbalance (QCM) method

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2014 .

Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist

Iwao Nishiyama, Takahiro Kozawa, Seiichi Tagawa, 2006 .

Radiation-induced reactions of chemically amplified x-ray and electron-beam resists based on deprotection of t-butoxycarbonyl groups

Takahiro Kozawa, Seiichi Tagawa, Seiji Nagahara, 1997 .

Reaction mechanism of fluorinated chemically amplified resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2006 .

Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Takahiro Kozawa, 2012 .

Formation and decay of fluorobenzene radical anions affected by their isomeric structures and the number of fluorine atoms.

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2010, The journal of physical chemistry. A.

High-Absorption Resist Process for Extreme Ultraviolet Lithography

Takahiro Kozawa, Seiichi Tagawa, 2008 .

Dissolution characteristics of chemically amplified extreme ultraviolet resist

Koji Kaneyama, Toshiro Itani, Takahiro Kozawa, 2008 .

Eco-friendly electron beam lithography using water-developable resist material derived from biomass

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2012 .

Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography

Hiroki Yamamoto, Takahiro Kozawa, Masaki Mitsuyasu, 2015 .

Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography

Takahiro Kozawa, 2015 .

Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014 .

Line edge roughness after development in a positive-tone chemically amplified resist of post-optical lithography investigated by Monte Carlo simulation and a dissolution model.

Takahiro Kozawa, Seiichi Tagawa, Hai Deng, 2008, Nanotechnology.

Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, 2007 .

Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2009 .

Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography

Minoru Toriumi, Julius Joseph Santillan, Toshiro Itani, 2007 .

Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer

Takahiro Kozawa, Seiichi Tagawa, Tsutomu Shimokawa, 2007 .

Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, 2008 .

Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2007 .

Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists

Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa, 2008 .

Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters

Toshiro Itani, Hiroki Yamamoto, Takahiro Kozawa, 2017 .

Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, 2008 .

Correlation betweenC37Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2009 .

Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2013 .

Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2004 .

Relationship between information and energy carried by photons in extreme ultraviolet lithography: Consideration from the viewpoint of sensitivity enhancement

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2015 .

Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography

Hiroki Yamamoto, Takahiro Kozawa, Yoshitaka Komuro, 2013 .

Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations

Takahiro Kozawa, Seiichi Tagawa, Akinori Saeki, 2009 .

Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa, 2010 .

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

Takahiro Kozawa, Seiichi Tagawa, Mitsuru Uesaka, 1992 .

Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, 2012 .

Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2010 .

Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2006 .

Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography

Takahiro Kozawa, Seiichi Tagawa, S. Tagawa, 2007 .

Relationship between Resolution Blur and Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme-Ultraviolet Lithography

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2018, Journal of Photopolymer Science and Technology.

Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography

Takahiro Kozawa, T. Kozawa, 2019, Japanese Journal of Applied Physics.

Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Seiichi Tagawa, Melissa Shell, 2008 .

Study on intermediate species of polystyrene by using pulse radiolysis

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2001 .

Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2006 .

Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography

Takahiro Kozawa, Seiichi Tagawa, Akinori Saeki, 2008 .

Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2006 .

Effects of Polymer Interference during Acid Generation on Latent Image Quality of Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa, 2008 .

Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists

Takahiro Kozawa, 2015 .

Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography

Minoru Toriumi, Julius Joseph Santillan, Toshiro Itani, 2007 .

Proton Dynamics in Chemically Amplified Electron Beam Resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2004 .

Theoretical Study on Chemical Gradient Generated in Chemically Amplified Resists Based on Polymer Deprotection upon Exposure to Extreme Ultraviolet Radiation

Takahiro Kozawa, Seiichi Tagawa, 2009 .

Study of Acid-Base Equilibrium in Chemically Amplified Resist

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2007 .

Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2017 .

Incorporation of chemical amplification in dual insolubilization resists

Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, 2019, Japanese Journal of Applied Physics.

Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2006 .

Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, 2013 .

Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2005 .

Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014 .

Development of subpicosecond pulse radiolysis system

Takahiro Kozawa, Seiichi Tagawa, S. Suemine, 2000 .

Effects of an organotin compound on radiation-induced reactions of extreme-ultraviolet resists utilizing polarity change and radical crosslinking

Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, 2018, Japanese Journal of Applied Physics.

Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2012 .

Direct Oxidation of the [2Fe-2S] Cluster in SoxR Protein by Superoxide

Takahiro Kozawa, T. Kozawa, Kazuo Kobayashi, 2012, The Journal of Biological Chemistry.

Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists

Takahiro Kozawa, Taku Hirayama, 2014 .

Analysis of acid yield generated in chemically amplified electron beam resist

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2006 .

Formation of intramolecular poly(4-hydroxystyrene) dimer radical cation.

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2008, The journal of physical chemistry. B.

Proton and anion distribution and line edge roughness of chemically amplified electron beam resist

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2005 .

Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists

Minoru Toriumi, Julius Joseph Santillan, Toshiro Itani, 2008 .

Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution

Hiroki Yamamoto, Takahiro Kozawa, Takuya Ishida, 2016 .

Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2019, Journal of Photopolymer Science and Technology.

Acid distribution in chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, 2007 .

Thermalization Distance of Electrons Generated in Poly(4-hydroxystyrene) Film Containing Acid Generator upon Exposure to Extreme Ultraviolet Radiation

Takahiro Kozawa, Seiichi Tagawa, 2011 .

Precise measurement of a subpicosecond electron single bunch by the femtosecond streak camera

Toru Ueda, Takahiro Kozawa, Mitsuru Uesaka, 1998 .

Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, 2007 .

Reactivity between biphenyl and precursor of solvated electrons in tetrahydrofuran measured by picosecond pulse radiolysis in near-ultraviolet, visible, and infrared.

Takahiro Kozawa, Seiichi Tagawa, Akinori Saeki, 2007, The journal of physical chemistry. A.

Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa, 2010 .

UV Photoemission Study of AlGaN Grown by Metalorganic Vapor Phase Epitaxy

Takahiro Kozawa, Yasunori Taga, Tomohiko Mori, 2000 .

Correlation between proton dynamics and line edge roughness in chemically amplified resist for post-optical lithography

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, 2006 .

Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet Resist

Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa, 2012 .

Raman scattering from LO phonon‐plasmon coupled modes in gallium nitride

Tetsu Kachi, Takahiro Kozawa, Masafumi Hashimoto, 1994 .

Normalized Image Log Slope with Secondary Electron Migration Effect in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa, 2009 .

Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons

Takahiro Kozawa, Seiichi Tagawa, Tsutomu Shimokawa, 2008 .