Y. Ido

Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges

K. Nafus, Y. Feurprier, S. Nagahara, 2022, Advanced Lithography.

Pattern defect reduction and LER improvement of chemo-epitaxy DSA process

Makoto Muramatsu, Takahiro Kitano, Kiyohito Ito, 2017, Advanced Lithography.

Analysis of Molecular Orientation within Self-Organized Dye Particles with Near-Field and Polarized Evanescent-Field Excited Fluorescence

A. Tomioka, Y. Ido, T. Motokubota, 2006 .

Near-Field Optical Characterization of Sub-Micrometer Particle Arrays of Organic Pigment

A. Tomioka, Y. Ido, T. Motokubota, 2006 .

Near-field and evanescent field study of molecular orientation within self-organized particles of organic dye

A. Tomioka, Y. Ido, T. Motokubota, 2005, International Quantum Electronics Conference.