Sup-Youl Ju

Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma

S. Woo, S. Kim, Jinho Ahn, 2000 .

Study of the etching mechanism of tantalum thin films by argon actinometry

S. Woo, Jinho Ahn, Sanghoon Kim, 2002 .