Takao Arase

Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO2 stacks

T. Iwase, M. Matsui, K. Yokogawa, 2016 .

Asymmetric etching profile control during high aspect ratio Plasma etch

Chih-Yuan Lu, Tahone Yang, Kuang-Chao Chen, 2018, Advanced Semiconductor Manufacturing Conference.