Jung-Won Shin

Overcoming the reliability limitation in the ultimately scaled DRAM using silicon migration technique by hydrogen annealing

Sungjoo Hong, Seong-Wan Ryu, T. Jang, 2017, 2017 IEEE International Electron Devices Meeting (IEDM).

Generation mechanism of large-size invisible defects on Si epitaxial wafers

Jung-Hoon Park, Bo-Young Lee, Ja-Young Kim, 2017 .